THE POROUS SILICON MORPHOLOGY EFFECT ON THE GROWTH OF ELECTRODEPOSITED FENI ALLOY

SOUAD OUIR, S. SAM, G. FORTAS, H. ALIOUAT, N. GABOUZE, N. GHELLAI

Résumé


Abstract:
In this work, we report on cathodic deposition of FeNi thin films into Porous Silicon (PS)
formed on n-type Si.the PS layers were fabricated at different potential or current density.
Then macroporous and mesoporous Silicon layer were formed. The electrodeposited thin
films were characterized by energy dispersive spectroscopy (EDS), X-ray diffraction
(XRD). The magnetic properties of the FeNi layers were investigated by magneto-optic
Kerr effect (Moke) measurements. The results show that the FeNi is predetermined by the
pore Si morphology and follows the pore silicon cylindrical-like, tubular form has been
obtained. In addition, it has been observed that FeNi grains decorate inter of the pore.the
composition of the FeNi films obtained is close to permalloy. Finally, the XRD Spectra of the
deposited films show the presence of the FeNi (111) and FeNi (220) peaks. The presence of
the FeNi (111) has been shown for all ionization potential, in agreement with results reported
in the literature.

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