FENI ALLOYS ELECTROPLATED INTO POROUS (N-TYPE) SILICON

SOUAD OUIR, S. SAM, G. FORTAS, N. GABOUZE, K. FERDJANI, K. BELDJILALI

Résumé


Abstract:
FeNi alloys have a variety of high technology applications (such as magnetic storage devices
and sensors) due to their wide spectrum of physical properties. A simple and inexpensive
production technique of magnetic thin films is electrodeposition. It has been used successfully
in the case of FeNi alloys for a wide range of concentrations of both elements.
We report here the study about the electrodeposition of FeNi alloys into porous silicon (PS)
made in n-type Si (1-10 S2cm).
The electrodeposited thin films were characterized by scanning electron microscopy (SEM),
energy dispersive spectroscopy (EDS), X-ray diffraction (XRD) and secondary ion mass
spectrometry (SIMS).
The results show that the morphology, composition and structure of the deposited FeNi alloys
are strongly dependent on the deposition conditions. A tubular structure of the FeNi alloys has
been obtained with a chemical composition of (80%) Ni (20%) Fe.
Finally, SEM and SIMS characterization show that the FeNi alloy deeply penetrates into PS.

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